Company Filing History:
Years Active: 2017-2019
Title: Zhenyu Bao: Innovator in Chemical Mechanical Polishing
Introduction
Zhenyu Bao is a prominent inventor based in Potsdam, NY (US). He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of 5 patents to his name. His work focuses on developing innovative compositions that enhance the efficiency and effectiveness of CMP processes.
Latest Patents
Zhenyu Bao's latest patents include a chemical-mechanical polishing (CMP) composition that comprises a polymeric polyamine. This composition features inorganic and organic particles, along with a polymeric polyamine or its salt, which contains various functional groups such as carboxylate, sulfonate, and phosphonate. Another notable patent describes a CMP composition that includes surface modified silica particles with a negative zeta potential and one or more N-vinyl homopolymers or copolymers, ensuring optimal performance in specific pH ranges.
Career Highlights
Zhenyu Bao is currently associated with BASF SE Corporation, where he continues to innovate in the field of chemical mechanical polishing. His expertise and research have positioned him as a key figure in advancing CMP technologies.
Collaborations
Some of Zhenyu Bao's notable coworkers include Yongqing Lan and Peter Przybylski. Their collaborative efforts contribute to the ongoing development of cutting-edge CMP solutions.
Conclusion
Zhenyu Bao's contributions to the field of chemical mechanical polishing through his innovative patents and collaborations highlight his role as a leading inventor. His work continues to influence the industry and drive advancements in CMP technology.