Singapore, Singapore

Zhenkang Max Liang


Average Co-Inventor Count = 16.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovating Substrate Processing: The Contributions of Zhenkang Max Liang

Introduction

Zhenkang Max Liang is an accomplished inventor based in Singapore, SG, known for his significant contributions to substrate processing technologies. He currently holds one patent, showcasing his expertise and innovative spirit in the field. His work has established him as a notable figure within the semiconductor industry.

Latest Patents

Zhenkang Max Liang's patent focuses on a substrate processing method and apparatus. This invention details a sophisticated process conducted within a chamber designed specifically for substrate processing. The method involves providing a substrate on a support, supplying a first processing gas, and alternating between continuous RF signal and pulsed RF signal while applying a negative DC voltage to an upper electrode to generate plasma from the processing gas. The method is efficient, with a specific emphasis on timing, stating that the RF signal processing step must be completed in 30 seconds or less. This innovation not only enhances substrate processing efficiency but also contributes to advancements in semiconductor fabrication.

Career Highlights

Zhenkang Max Liang is associated with Tokyo Electron Limited, a leading company in the semiconductor production equipment industry. His work at the company involves leveraging cutting-edge technologies to improve processing methods and equipment. This engagement highlights a commitment to enhancing manufacturing processes in the semiconductor sector.

Collaborations

Throughout his career, Zhenkang Max Liang has collaborated with esteemed colleagues, such as Seiichi Watanabe and Kazuki Narishige. These partnerships have fostered an environment of innovation and knowledge sharing, crucial for developing new technologies and refining existing methodologies in substrate processing.

Conclusion

Zhenkang Max Liang's dedication to innovating substrate processing methods has marked him as a pivotal player in the field. With his patent contributions while working at Tokyo Electron Limited, he continues to influence the landscape of semiconductor manufacturing, driving progress and efficiency in the industry. His collaborations further enrich his endeavors, ensuring the continual evolution of technologies that will shape the future of electronics.

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