Zhengyu Wang

Title: Innovations by Zhengyu Wang in Reticle Inspection Technology

Introduction

Zhengyu Wang is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of reticle inspection technology. With a total of 2 patents, his work focuses on enhancing the accuracy and reliability of defect detection in optical imaging systems.

Latest Patents

Wang's latest patents include a method for detecting thin lines for selective sensitivity during reticle inspection using processed images. This innovative detection method involves constructing a band-limited spot image from both transmitted and reflected optical images of the mask. The calibration of the spot image is crucial as it reduces noise introduced by various inspection systems. By generating a non-printable feature map and a printable feature map, the method allows for a more effective analysis of test images to detect defects on the mask. Additionally, another patent by Wang also addresses the generation of a band-limited spot image, focusing on minimizing optical aberrations. This restoration process enables more reliable segmentation between thin line and non-thin line areas, facilitating accurate line width measurements.

Career Highlights

Zhengyu Wang is currently employed at Kla Tencor Corporation, where he continues to develop innovative solutions in the field of optical inspection. His expertise in this area has positioned him as a key contributor to advancements in reticle inspection technology.

Collaborations

Wang has collaborated with several talented individuals, including Rui-Fang Shi and Lih-Huah Yiin, who have worked alongside him in various projects at Kla Tencor Corporation.

Conclusion

Zhengyu Wang's contributions to reticle inspection technology through his patents demonstrate his commitment to innovation and excellence in the field. His work continues to influence the industry and improve the reliability of optical imaging systems.