Zhengkai Lu

Title: Innovations of Zhengkai Lu in Wafer Cleaning Technology

Introduction

Zhengkai Lu is a notable inventor based in Shanghai, China. He has made significant contributions to the field of wafer cleaning technology, holding 2 patents that showcase his innovative approaches. His work focuses on improving the efficiency and quality of cleaning processes in semiconductor manufacturing.

Latest Patents

Zhengkai Lu's latest patents include a "Method of controlling mixed liquid to be delivered for SPM solution" and a "Liquid delivering system for wafer cleaning equipment." The first patent describes a method that involves mixing sulfuric acid with hydrogen peroxide in a multi-stage process. This method ensures that the mixed liquid achieves the desired oxygen concentration for optimal cleaning results. The second patent outlines a liquid delivering system that incorporates an acid scouring tank, sulfuric acid and hydrogen peroxide supplying sources, and advanced mixing devices. This system allows for precise temperature control and ensures that the mixed liquid meets cleaning requirements, thereby enhancing the overall cleaning efficiency of wafers.

Career Highlights

Throughout his career, Zhengkai Lu has worked with reputable companies such as PNC Process Systems Co., Ltd. and Ultron Semiconductor (Shanghai) Co., Ltd. His experience in these organizations has contributed to his expertise in the semiconductor industry and his ability to develop innovative solutions.

Collaborations

Zhengkai Lu has collaborated with professionals like Dawei Liu and Ming Xu, further enriching his work and expanding his impact in the field of wafer cleaning technology.

Conclusion

Zhengkai Lu's contributions to wafer cleaning technology through his innovative patents demonstrate his commitment to enhancing the semiconductor manufacturing process. His work not only improves cleaning efficiency but also sets a standard for future innovations in the industry.