The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
Jan. 16, 2025
Pnc Process Systems Co., Ltd., Shanghai, CN;
Ultron Semiconductor (Shanghai) Co., Ltd., Shanghai, CN;
Yuan Jiang, Shanghai, CN;
Dawei Liu, Shanghai, CN;
Jing Zhang, Shanghai, CN;
Zhengkai Lu, Shanghai, CN;
Ming Xu, Shanghai, CN;
Panpan Li, Shanghai, CN;
Fangyi Lv, Shanghai, CN;
Chuanlong Liu, Shanghai, CN;
PNC PROCESS SYSTEMS CO., LTD., Shanghai, CN;
ULTRON SEMICONDUCTOR (SHANGHAI) CO., LTD., Shanghai, CN;
Abstract
A method of controlling mixed liquid to be delivered for SPM solution includes: before the SPM solution comes into an acid scouring tank, mixing the sulfuric acid with the hydrogen peroxide in a delivering pipe in a first stage and a second stage in turn, so as to make a mixed liquid after mixing in the first stage to further get mixed in the second stage; heating the mixed liquid in the first stage; monitoring an oxygen concentration value of the mixed liquid flowing out after mixing in the first stage; and if the oxygen concentration value is smaller than an oxygen concentration value at full reaction, adding supplementary sulfuric acid and hydrogen peroxide during mixing in the second stage, so as to enable the oxygen concentration value of the mixed liquid flowing out after mixing in the second stage monitored in real time to reach an oxygen concentration value.