Company Filing History:
2 out of 2 
2 out of 2 Years Active: 2025
Title: Innovations of Fangyi Lv in Wafer Cleaning Technology
Introduction
Fangyi Lv is an accomplished inventor based in Shanghai, China. He has made significant contributions to the field of wafer cleaning technology, holding 2 patents that showcase his innovative approaches.
Latest Patents
Fangyi Lv's latest patents include a "Method of controlling mixed liquid to be delivered for SPM solution." This method involves mixing sulfuric acid with hydrogen peroxide in a two-stage process before the SPM solution enters an acid scouring tank. The process includes heating the mixed liquid and monitoring its oxygen concentration to ensure optimal reaction conditions. His second patent, "Liquid delivering system for wafer cleaning equipment," describes a system that incorporates an acid scouring tank, sulfuric acid and hydrogen peroxide supplying sources, and multi-stage mixing devices. This system allows for precise temperature control and ensures that the mixed liquid meets cleaning requirements, thereby enhancing the quality and efficiency of wafer cleaning.
Career Highlights
Fangyi Lv has worked with notable companies such as PNC Process Systems Co., Ltd. and Ultron Semiconductor (Shanghai) Co., Ltd. His experience in these organizations has contributed to his expertise in the field of semiconductor cleaning technologies.
Collaborations
Fangyi has collaborated with professionals like Dawei Liu and Zhengkai Lu, who have contributed to his projects and innovations.
Conclusion
Fangyi Lv's innovative patents and career achievements highlight his significant role in advancing wafer cleaning technology. His work continues to impact the semiconductor industry positively.