Shanghai, China

Chuanlong Liu


Average Co-Inventor Count = 8.5

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
2 patents (USPTO):

Title: Innovations of Chuanlong Liu in Wafer Cleaning Technology

Introduction

Chuanlong Liu is a notable inventor based in Shanghai, China. He has made significant contributions to the field of wafer cleaning technology, holding a total of 2 patents. His innovative approaches have enhanced the efficiency and quality of cleaning processes in semiconductor manufacturing.

Latest Patents

Chuanlong Liu's latest patents include a "Method of controlling mixed liquid to be delivered for SPM solution" and a "Liquid delivering system for wafer cleaning equipment." The first patent outlines a method that involves mixing sulfuric acid with hydrogen peroxide in a controlled manner before the solution enters an acid scouring tank. This process includes monitoring the oxygen concentration to ensure optimal reaction conditions. The second patent describes a comprehensive liquid delivering system that features multi-stage mixing and precise temperature control, ensuring that the mixed liquid meets the stringent cleaning requirements for wafers.

Career Highlights

Throughout his career, Chuanlong Liu has worked with reputable companies such as PNC Process Systems Co., Ltd. and Ultron Semiconductor (Shanghai) Co., Ltd. His experience in these organizations has allowed him to apply his innovative ideas in practical settings, contributing to advancements in semiconductor cleaning technologies.

Collaborations

Chuanlong Liu has collaborated with talented individuals in his field, including Dawei Liu and Zhengkai Lu. These partnerships have fostered a creative environment that encourages the development of cutting-edge solutions in wafer cleaning.

Conclusion

Chuanlong Liu's contributions to wafer cleaning technology through his patents and collaborations highlight his role as an influential inventor in the semiconductor industry. His innovative methods and systems continue to improve the efficiency and effectiveness of cleaning processes, showcasing the importance of advancements in this critical area.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…