Zheng Min Clarence Chong

Title: Innovations by Zheng Min Clarence Chong

Introduction

Zheng Min Clarence Chong is a notable inventor based in Singapore, recognized for his contributions to the field of physical vapor deposition (PVD) technology. He holds two patents that showcase his innovative approaches to enhancing the deposition process and protecting components from thermal cycling effects.

Latest Patents

Chong's latest patents include "Methods and apparatus for depositing aluminum by physical vapor deposition (PVD) with controlled cooling." This invention involves a method for depositing a first aluminum layer atop a substrate, which is then cooled at a controlled rate to increase the grain size of the aluminum. His second patent, "Methods and apparatus for prevention of component cracking using stress relief layer," focuses on protecting parts of a process chamber from the thermal cycling effects of deposited materials. This method includes wet etching, bead blasting, and applying a stress relief layer to preserve the structural integrity of the components.

Career Highlights

Zheng Min Clarence Chong is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in the field of materials engineering. His work has significantly contributed to advancements in PVD technology, making processes more efficient and reliable.

Collaborations

Chong collaborates with talented individuals such as Siew Kit Hoi and Xinxin Wang, who contribute to the innovative environment at Applied Materials, Inc. Their teamwork fosters creativity and drives the development of cutting-edge technologies.

Conclusion

Zheng Min Clarence Chong's contributions to the field of physical vapor deposition and his innovative patents highlight his role as a significant inventor in the industry. His work not only advances technology but also enhances the reliability of manufacturing processes.