The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2023
Filed:
Oct. 16, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Yuichi Wada, Chiba, JP;
Kok Wei Tan, Singapore, SG;
Chul Nyoung Lee, Singapore, SG;
Siew Kit Hoi, Singapore, SG;
Xinxin Wang, Singapore, SG;
Zheng Min Clarence Chong, Singapore, SG;
Yaoying Zhong, Singapore, SG;
Kok Seong Teo, Singapore, SG;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods and apparatus for protecting parts of a process chamber from thermal cycling effects of deposited materials. In some embodiments, a method of protecting the part of the process chamber includes wet etching the part with a weak alkali or acid, cleaning the part by bead blasting, coating at least a portion of a surface of the part with a stress relief layer. The stress relief layer forms a continuous layer that is approximately 50 microns to approximately 250 microns thick and is configured to preserve a structural integrity of the part from the thermal cycling of aluminum deposited on the part. The method may also include wet cleaning of the part with a heated deionized water rinse after formation of the stress relief layer.