Xi'an, China

Zhe Zl Liu


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Zhe Zl Liu: Innovator in Code Deployment and Crack Detection

Introduction

Zhe Zl Liu is a prominent inventor based in Xi'an, China. He has made significant contributions to the fields of code deployment and crack detection, holding a total of 2 patents. His innovative work has implications for both software development and materials science.

Latest Patents

One of Liu's latest patents focuses on code deployment. This invention proposes a method, device, and computer program product for deploying code into multiple computing environments. The method involves obtaining a deployment strategy and determining the necessary code segments based on the resources available in each environment. This ensures that the resources are sufficient to run the deployed code segments effectively.

Another notable patent relates to systems and methods for crack detection in wafers, particularly silicon wafers used in photovoltaic devices. This invention includes an apparatus with a light source and a camera designed to detect cracks in the wafers. The camera's field of view is strategically angled to optimize the detection process, enhancing the reliability of photovoltaic devices.

Career Highlights

Throughout his career, Zhe Zl Liu has worked with prestigious institutions, including the Massachusetts Institute of Technology and International Business Machines Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities.

Collaborations

Liu has collaborated with notable professionals in his field, including Emanuel Michael Sachs and Tonio Buonassisi. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Zhe Zl Liu is a distinguished inventor whose work in code deployment and crack detection showcases his innovative spirit and technical expertise. His contributions continue to influence advancements in technology and materials science.

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