Dublin, CA, United States of America

Zhe Wang

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Asml Netherlands B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhe Wang. Retrieved from https://idiyas.com/inventor/zhe-wang-l8ew6xjt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Zhe Wang and Anomaly-Based Defect Inspection

Introduction

Zhe Wang is an inventor based in Dublin, California, whose patent work includes methods for identifying potential defects in samples through image analysis. The supplied information lists him as a man and identifies ASML Netherlands B.V. as his company.

Latest Patents

Wang is associated with 1 patent, titled “Method and System for Anomaly-Based Defect Inspection.” The invention describes receiving two associated images and using clustering techniques to determine feature descriptors for corresponding, co-located pixels. It then calculates mapping probabilities between descriptors and provides an output to help determine whether an abnormal pixel may represent a candidate defect. A candidate defect is identified when a mapping probability does not exceed a specified threshold.

Career Highlights

The patent reflects work on image-based inspection and anomaly detection, with a focus on evaluating corresponding image features to flag potential defects. The supplied information associates Wang with ASML Netherlands B.V.

Collaborations

Wang’s listed coworker is Yani Chen. The supplied information does not specify further details about their collaboration.

Conclusion

Zhe Wang’s listed patent addresses anomaly-based defect inspection by analyzing image features and mapping probabilities to identify candidate defects.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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