Company Filing History:
Years Active: 2019-2020
Title: Zhaoying Hu: Innovator in FinFET Technology
Introduction
Zhaoying Hu is a prominent inventor based in Clifton Park, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of FinFET devices. With a total of 2 patents, his work has advanced the capabilities of modern electronics.
Latest Patents
Zhaoying Hu's latest patents include innovative methods for forming FinFETs with gates parallel to fins. One of his patents describes methods that involve patterning a lower layer to create a fin and forming a sacrificial gate along the sidewalls of the fin. This process allows for the creation of a mask with cut openings on the sacrificial gate, enabling the division of the fin into portions and the formation of cut areas between them. Additionally, these methods facilitate the epitaxial growth of source/drains in the cut areas and the replacement of the sacrificial gate with a gate conductor, culminating in the formation of a gate contact over the center of the fin portions. Another patent focuses on using a source/drain contact cap during the gate cut process, where parallel fins are formed, and source/drain structures are integrated with the fins. This method enhances the efficiency of the gate structures and the overall performance of the FinFET devices.
Career Highlights
Zhaoying Hu is currently employed at Globalfoundries Inc., where he continues to push the boundaries of semiconductor technology. His expertise in FinFET design and fabrication has positioned him as a key player in the industry. His innovative approaches have not only contributed to his company's success but have also influenced the broader field of electronics.
Collaborations
Throughout his career, Zhaoying has collaborated with notable colleagues, including Hui Zang and Yanping Shen. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Zhaoying Hu's contributions to FinFET technology exemplify his dedication to innovation in the semiconductor industry. His patents reflect a deep understanding of complex engineering principles and a commitment to advancing electronic device performance. His work continues to inspire future developments in the field.