Company Filing History:
3 out of 101 
1 out of 14 
1 out of 207 Years Active: 2017-2022
Title: Innovations by Zhanyuan Hu: A Pioneer in Semiconductor Manufacturing
Introduction
Zhanyuan Hu, a notable inventor based in Shanghai, China, has made significant contributions to the field of semiconductor manufacturing. With a portfolio comprising five patents, Hu's work primarily focuses on the development of advanced manufacturing methods for fin field-effect transistors and epitaxial growth processes, showcasing his innovative spirit and technical expertise.
Latest Patents
Among his latest inventions, the "Manufacturing Method of Fin Field-Effect Transistor" stands out. This patent discloses a novel technique for creating a fin field-effect transistor, detailing the formation of a fin structure along with a gate structure on a substrate. Additionally, it describes the creation of a source-drain region, which involves forming an epitaxial layer and a sacrificial layer to protect the epitaxial layer during subsequent removal steps.
Another significant patent by Zhanyuan Hu is the "Epitaxial Growth Process for Semiconductor Device and Semiconductor Device Comprising Epitaxial Layer Formed by Adopting the Same." This invention outlines a process that includes providing a semiconductor substrate with Dummy Gate structures and self-aligned grooves. It details the formation of an initial seed layer and its subsequent etching to create a main body layer that fills the grooves, ultimately enhancing the semiconductor's efficiency.
Career Highlights
Hu has had an impressive career, working with prominent companies such as Shanghai Huali Integrated Circuit Corporation and Shanghai Huali Integrated Circuit Mfg. Co., Ltd. His experiences in these organizations have allowed him to refine his skills and contribute to groundbreaking technologies that drive the semiconductor industry forward.
Collaborations
Throughout his career, Zhanyuan Hu has had the opportunity to collaborate with other talented professionals, including Yongji Mao and Ronghong Ye. Together, they have worked on various innovative projects that have contributed to advancements in semiconductor technology.
Conclusion
Zhanyuan Hu's innovative approach and dedication to research have established him as a prominent figure in the semiconductor manufacturing sector. His patents reflect a commitment to improving manufacturing processes, which have the potential to significantly impact the future of electronics. As he continues to develop new technologies, Hu's contributions will likely pave the way for further advancements in the industry.