Chongqing, China

Zhanjin Lu

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Ccteg Chongqing Research Institute. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhanjin Lu. Retrieved from https://idiyas.com/inventor/zhanjin-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

Average Co-Inventor Count = 15.4

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Zhanjin Lu and Coal-Seam Cutting Technology.

Introduction

Zhanjin Lu is an inventor based in Chongqing, China, associated with CCTEG Chongqing Research Institute. His patent work includes technologies for coal-seam pressure relief and permeability improvement. The provided information lists 3 patents.

Latest Patents

Lu’s listed inventions include the “Rear-Mounted Double-Channel Abrasive Jet Cutting Device.” The device conveys high-pressure water and abrasive through separate channels, helping reduce wear to hoses and drilling tools and avoid pressure loss in the water channel. Its design aims to improve coal-breaking performance and extend the cutting apparatus’s service life.

Another listed patent is “Mining Hose Connecting Device and Method.” The available information does not provide further details about its design or operation.

Career Highlights

Lu’s listed patent activity is connected with CCTEG Chongqing Research Institute and focuses, in part, on equipment for mining and coal-seam treatment. The supplied data identifies Chongqing as his location.

Collaborations

The provided information names Yongjiang Zhang and Lindong Guo as Lu’s coworkers. It does not specify their roles in the listed inventions or patents.

Conclusion

Zhanjin Lu’s listed inventions address mining equipment, including a double-channel abrasive jet cutting device designed to improve coal-breaking performance while reducing wear and pressure loss.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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