Hockessin, DE, United States of America

Zhan Liu

This inventor holds 1 USPTO granted patent. Top assignee: Rohm and Haas Electronic Materials Cmp Holdings, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhan Liu. Retrieved from https://idiyas.com/inventor/zhan-liu-hc5vvy4s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Zhan Liu: Innovator in Chemical Mechanical Polishing Technology

Introduction

Zhan Liu is a notable inventor based in Hockessin, Delaware, who has made significant contributions to the field of chemical mechanical polishing. His innovative work has led to the development of advanced polishing pads that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Zhan Liu holds a patent for a "Composite pad for chemical mechanical polishing." This invention features a chemical mechanical polishing pad that comprises a substantially non-porous polishing layer. The polishing layer consists of a polymer matrix and agglomerates of polymer particles embedded within it. The polymer particles are present in amounts ranging from 5 to 35 weight percent based on the weight of the polishing layer. The agglomerates have a size greater than 1 μm, and the polymer particles possess a tensile modulus that is higher than that of the polymer matrix. This unique design results in a viscoelastic polishing layer with a GEL of greater than 1000 Pa. The use of this pad for polishing metal/insulator composites can lead to minimal dishing of the metal features, showcasing its effectiveness in the industry.

Career Highlights

Zhan Liu is associated with Rohm and Haas Electronic Materials CMP Holdings, Inc., where he applies his expertise in developing innovative materials for chemical mechanical polishing. His work has been instrumental in advancing the technology used in semiconductor manufacturing, contributing to improved product quality and performance.

Collaborations

Zhan Liu has collaborated with esteemed colleagues, including Nan-Rong Chiou and Michael E. Mills. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.

Conclusion

Zhan Liu's contributions to the field of chemical mechanical polishing through his patented innovations demonstrate his commitment to advancing technology in semiconductor manufacturing. His work continues to impact the industry positively, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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