Gdansk, Poland

Zenon Zakrzewski

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 50(Granted Patents)


Location History:

  • Montreal, CA (1989)
  • Gdansk, PL (2001 - 2010)

Company Filing History:


Years Active: 1989-2010

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Zenon Zakrzewski: Innovator in Microwave Plasma Technology

Introduction

Zenon Zakrzewski is a notable inventor based in Gdansk, Poland. He has made significant contributions to the field of microwave plasma technology, holding a total of 4 patents. His work focuses on developing devices that enhance the efficiency and functionality of plasma generation.

Latest Patents

One of his latest inventions is the "Microwave Plasma Exciters." This device includes a waveguide for concentrating microwaves and a plasma generator for forming plasma, which are strategically placed in a microwave concentration zone. Another significant patent is the "Power Splitter for Plasma Device." This system comprises a microwave generator and a rectangular guide connected to the generator. It operates in fundamental or transverse electrical mode and features multiple power connectors arranged in the guide at zones of maximum amplitude. These connectors are designed to ensure efficient power transmission without reflection.

Career Highlights

Zenon Zakrzewski has worked with prominent organizations such as L'Air Liquide Société Anonyme Pour L'Étude Et L'Exploitation Des Procédés Georges Claude and Université de Montréal. His experience in these institutions has allowed him to refine his expertise in microwave technology and plasma applications.

Collaborations

Throughout his career, Zakrzewski has collaborated with notable professionals, including Michel Moisan and Jean-Christophe Rostaing. These partnerships have contributed to the advancement of his innovative projects.

Conclusion

Zenon Zakrzewski's contributions to microwave plasma technology demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of the complexities involved in plasma generation and microwave applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…