The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 1989

Filed:

Jul. 02, 1986
Applicant:
Inventors:

Michel Moisan, Montreal, CA;

Zenon Zakrzewski, Montreal, CA;

Assignee:

Universite de Montreal, Montreal, CA;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ; H01P / ;
U.S. Cl.
CPC ...
315 39 ; 31323131 ; 313485 ; 313493 ; 31511121 ; 315248 ; 333 / ; 333 / ; 333 32 ; 333232 ; 219 / ;
Abstract

The present invention relates to a device for generating plasma (ionizing gas) by a propagating surface wave. The device comprises a wave launching structure mounted on a plasma vessel and connected to an impedance matching network. The latter comprises a coupler and a tuner which is either formed by a section of a transmission line or is of the lumped circuitry type. The launching structure may either generate an azimuthally symmetric or a non symmetric propagating wave. This invention also relates to a method and a device for shaping plasma which comprises a plasma vessel receiving a surface wave generator and having a serviceable portion of a size and/or shape substantially different from the shape and/or size of the portion of the plasma vessel receiving the wave generator.


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