Zengsheng Xu

Title: Zengsheng Xu: Innovator in Semiconductor Technology

Introduction

Zengsheng Xu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to semiconductor structures and fabrication methods.

Latest Patents

Zengsheng Xu's latest patents include a semiconductor structure and a method for forming a semiconductor structure. The semiconductor structure patent describes a design that includes a substrate, a dielectric layer, an opening through the dielectric layer, a contact layer at the bottom of the opening, a blocking layer on the sidewall surface of the opening, and a plug formed in the opening. The plug is in contact with the contact layer and is formed on the sidewall surface of the blocking layer. His second patent outlines a method for creating a semiconductor structure, which involves forming a dielectric layer with an opening on a substrate, creating a material film in the opening, and forming a blocking film on the material film. The process includes removing the blocking film at the bottom of the opening to expose the material film, followed by the formation of a conductive-material film and an annealing process to create a contact layer.

Career Highlights

Zengsheng Xu has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International (Shanghai) Corporation and Semiconductor Manufacturing International (Beijing) Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Zengsheng Xu has collaborated with several professionals in his field, including Hao Kai Zhang and Xuezhen Jing. These collaborations have likely enriched his work and led to further innovations in semiconductor technology.

Conclusion

Zengsheng Xu is a notable inventor whose work in semiconductor technology has led to valuable patents and advancements in the field. His contributions continue to influence the industry and inspire future innovations.