Wuxi, China

Zehuang Luo

This inventor holds 1 USPTO granted patent. Top assignee: Csmc Technologies Fab1 Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zehuang Luo. Retrieved from https://idiyas.com/inventor/zehuang-luo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Zehuang Luo: Innovator in Semiconductor Manufacturing

Introduction

Zehuang Luo is a prominent inventor based in Wuxi New District, China. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique manufacturing method for semiconductor devices.

Latest Patents

Zehuang Luo holds a patent for a manufacturing method for a semiconductor device with a discrete field oxide structure. This method involves several intricate steps, including the growth of a first PAD oxide layer on a wafer's surface, the formation of a silicon nitride layer, and the use of photolithography and etching techniques. The process optimizes the length of the bird beak of the field oxide, addressing common challenges in semiconductor manufacturing. He has 1 patent to his name.

Career Highlights

Luo is currently employed at CSMC Technologies Fab1 Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.

Collaborations

Throughout his career, Zehuang Luo has collaborated with notable colleagues, including Jian Xu and Min He. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Zehuang Luo's contributions to semiconductor manufacturing exemplify the spirit of innovation in the technology sector. His patented methods and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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