Hsinchu, Taiwan

Zack Chong

USPTO Granted Patents = 3 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021-2025

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations of Zack Chong in Semiconductor Technology

Introduction

Zack Chong is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of gate stack treatments. With a total of 3 patents to his name, his work has been influential in advancing manufacturing processes in the industry.

Latest Patents

One of Zack Chong's latest patents focuses on a method for forming gate stack layers with a fluorine concentration of up to about 35 at. %. This innovative method includes the formation of a dielectric stack and a barrier layer, followed by soaking these layers in a fluorine-based gas. Additionally, the process involves depositing one or more work function layers on the high-k dielectric layer and soaking at least one of these layers in the fluorine-based gas. The method also incorporates an optional fluorine drive-in annealing process, along with a sacrificial blocking layer to prevent fluorine out-diffusion and loss into the atmosphere.

Career Highlights

Zack Chong is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor technology. His expertise and innovative approaches have made him a valuable asset to the company and the industry as a whole.

Collaborations

Zack has collaborated with notable colleagues, including Chandrashekhar Prakash Savant and Chia-Ming Tsai. These collaborations have further enhanced his research and development efforts in semiconductor innovations.

Conclusion

Zack Chong's contributions to semiconductor technology, particularly through his patented methods, demonstrate his commitment to innovation in the field. His work not only advances manufacturing processes but also sets a foundation for future developments in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…