Los Gatos, CA, United States of America

Zachary Reid

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Zachary Reid

Introduction

Zachary Reid is a notable inventor based in Los Gatos, California. He has made significant contributions to the field of measurement technology, particularly through his innovative patent. His work is characterized by a focus on precision and efficiency in substrate processing.

Latest Patents

Zachary Reid holds a patent for a "Process condition measuring device." This instrument is designed to measure various parameters through a substrate that carries multiple sensors. These sensors are strategically distributed across the substrate's surface, allowing for individual measurements at different positions. The device includes an electronic processing component, electrical conductors, and a protective cover, all designed to mimic the properties of a production substrate. This innovation enables the characterization of a production wafer's behavior during substrate processing, enhancing the overall efficiency of the process.

Career Highlights

Zachary Reid is currently employed at KLA-Tencor Corporation, a leading company in the field of process control and yield management solutions. His role at the company allows him to apply his expertise in measurement technology to real-world applications, contributing to advancements in the semiconductor industry.

Collaborations

Zachary has collaborated with talented coworkers such as Mei H Sun and Mark Wiltse. Their combined efforts in research and development have furthered the capabilities of measurement devices in substrate processing.

Conclusion

Zachary Reid's innovative work in developing a process condition measuring device showcases his commitment to advancing technology in the semiconductor industry. His contributions are vital for improving measurement accuracy and efficiency in substrate processing.

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