Yves Alban-Marie Arnal

Title: Yves Alban-Marie Arnal: Innovator in Electron Beam Technology

Introduction

Yves Alban-Marie Arnal is a notable inventor based in Poisat, France. He has made significant contributions to the field of electron beam technology, holding a total of 5 patents. His work focuses on developing innovative solutions that enhance the efficiency and functionality of electron beam sources.

Latest Patents

One of his latest patents is a source for providing an electron beam of settable power. This invention involves a plasma chamber that supplies an adjustable energy electron beam. The design includes an enclosure with an inner surface and an extraction gate, where the gate potential is adjustable. The plasma is excited and confined in multipolar or multidipolar magnetic structures, optimizing the performance of the electron beam. Another significant patent is a method of producing a sheet comprising through pores, which is applicable in the production of micronic and submicronic filters. This method outlines the steps necessary for fabricating these advanced filters, showcasing Arnal's expertise in material science.

Career Highlights

Throughout his career, Yves Alban-Marie Arnal has worked with esteemed organizations, including the Centre National de la Recherche Scientifique. His contributions to research and development have been instrumental in advancing technologies related to electron beams and filtration systems.

Collaborations

Arnal has collaborated with notable colleagues such as Ana Lacoste and Jacques Henri Pelletier. These partnerships have fostered innovation and have been crucial in the development of his patented technologies.

Conclusion

Yves Alban-Marie Arnal's work exemplifies the spirit of innovation in the field of electron beam technology. His patents reflect a commitment to advancing scientific knowledge and practical applications in this area.