The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Dec. 06, 2002
Ana Lacoste, Saint Martin Le Vinoux, FR;
Jacques Pelletier, Saint Martin D'Heres, FR;
Yves Alban-marie Arnal, Poisat, FR;
Ana Lacoste, Saint Martin Le Vinoux, FR;
Jacques Pelletier, Saint Martin D'Heres, FR;
Yves Alban-Marie Arnal, Poisat, FR;
Centre National de la Recherche Scientifique, Paris, Cedex, FR;
Abstract
The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure () having an inner surface of a first value (S) and an extraction gate () having a surface of a second value (S), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S) over the first value (S) being close to: D=1/β √2πm/mexp (−½), wherein: β is the proportion of electrons of the plasma P, mthe electron mass, and mis the mass of positively charged ions.