Yuya Takamura

Title: Yuya Takamura: Innovator in Deposition and Film Forming Technologies

Introduction

Yuya Takamura is a prominent inventor based in Iwate, Japan. He has made significant contributions to the field of deposition methods and film forming technologies. With a total of 2 patents to his name, Takamura's work is recognized for its innovative approaches and practical applications.

Latest Patents

Takamura's latest patents include a deposition method that involves performing multiple execution cycles serially. Each cycle consists of supplying a raw material gas into a process chamber and a reactant gas that reacts with the raw material gas. Notably, at least one execution cycle adjusts the pressure in the process chamber without supplying the raw material gas, enhancing the efficiency of the process.

Another significant patent is a film forming method and system that deposits a thin film of a reaction product generated by the interaction between a raw material gas and a reactive gas on a substrate. This method involves storing the raw material gas in a reservoir, adsorbing it on the substrate, and then reacting it with the reactive gas to generate the desired reaction product. The process is repeated multiple times while varying the conditions for storing the raw material gas.

Career Highlights

Yuya Takamura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to develop and refine his innovative techniques in deposition and film forming.

Collaborations

Takamura collaborates with Masami Oikawa, a fellow innovator in the field. Their partnership has contributed to advancements in the technologies they are developing.

Conclusion

Yuya Takamura's contributions to deposition methods and film forming technologies highlight his role as a key innovator in the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.