Yuya Nagata

Title: Innovations of Yuya Nagata in Reflective Mask Technology

Introduction

Yuya Nagata is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of reflective mask technology. With a total of three patents to his name, he has made notable advancements that enhance the efficiency and effectiveness of extreme ultraviolet (EUV) lithography.

Latest Patents

Nagata's latest patents include innovations such as the reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask. The reflective mask blank comprises a substrate, a multilayer reflective film that reflects EUV light, a protection film that safeguards the multilayer reflective film, and a phase shift film that alters the phase of the EUV light. The phase shift film is primarily composed of iridium (Ir), and it is designed to achieve specific optical properties. Notably, the intensity ratio of diffracted light from the phase shift film is carefully controlled, ensuring optimal performance in EUV applications.

Career Highlights

Yuya Nagata is currently employed at AGC Inc., where he continues to push the boundaries of innovation in his field. His work has been instrumental in developing technologies that are crucial for advanced semiconductor manufacturing processes.

Collaborations

Throughout his career, Nagata has collaborated with esteemed colleagues such as Daijiro Akagi and Kenichi Sasaki, contributing to a dynamic research environment that fosters innovation and creativity.

Conclusion

In summary, Yuya Nagata's contributions to reflective mask technology have positioned him as a key figure in the advancement of EUV lithography. His innovative patents and collaborative efforts continue to influence the industry positively.