This inventor holds 1 USPTO granted patent. Top assignee: Denso Corporation. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Yuya Kato: Innovator in Surface Processing Technology
Introduction
Yuya Kato is a notable inventor based in Kariya, Japan. He has made significant contributions to the field of surface processing technology, particularly in the development of methods and apparatus for processing silicon carbide (SiC) substrates. His innovative work has implications for various applications in electronics and materials science.
Latest Patents
Yuya Kato holds a patent for a "Surface processing apparatus and surface processing method for SiC substrate." This invention provides a surface processing apparatus that includes a surface processing pad and a power supply device. The surface processing pad features a grinding wheel layer that is positioned to face the workpiece surface of the SiC substrate. The power supply device is designed to pass a pulsed current with a period greater than 0.01 seconds and less than or equal to 20 seconds for anodizing the workpiece surface. This process occurs through the SiC substrate, which acts as an anode in the presence of an electrolyte.
Career Highlights
Yuya Kato is currently employed at Denso Corporation, a leading global automotive components manufacturer. His role at Denso has allowed him to apply his expertise in surface processing technology to enhance product performance and reliability. His innovative approach has contributed to the advancement of manufacturing processes within the company.
Collaborations
Yuya Kato has collaborated with notable colleagues, including Kazufumi Aoki and Naoki Maruno. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
In summary, Yuya Kato is a distinguished inventor whose work in surface processing technology has made a significant impact in the field. His patent for a surface processing apparatus and method for SiC substrates exemplifies his innovative spirit and dedication to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
