Raanana, Israel

Yuval Dafna

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuval Dafna. Retrieved from https://idiyas.com/inventor/yuval-dafna

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2017

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yuval Dafna: Innovator in Closed-Loop Systems

Introduction

Yuval Dafna is a notable inventor based in Raanana, Israel. He has made significant contributions to the field of transceiver circuitry through his innovative work. His expertise lies in developing technologies that enhance the performance of electronic devices.

Latest Patents

Yuval holds a patent for a technology titled "Pre-distortion calibration." This patent describes an implementation of a closed-loop system designed to measure and compensate for non-linearity in the transceiver circuitry of a device. This advancement is crucial for improving the accuracy and efficiency of communication systems.

Career Highlights

Yuval Dafna is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing and computing solutions. His role at Intel allows him to work on cutting-edge technologies that shape the future of electronic devices.

Collaborations

Throughout his career, Yuval has collaborated with talented individuals such as Ilan Sutskover and Roy Nahum. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Yuval Dafna's contributions to the field of transceiver circuitry and his patent on pre-distortion calibration highlight his role as an influential inventor. His work at Intel Corporation and collaborations with other professionals further emphasize his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…