Ube, Japan

Yuuzou Katou

This inventor holds 1 USPTO granted patent. Top assignees: Nippon Tungsten Co., Ltd., Ube Material Industries, Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuuzou Katou. Retrieved from https://idiyas.com/inventor/yuuzou-katou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 9.0

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Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Yuuzou Katou: Advancements in MgO Sputtering Technology

Introduction

Yuuzou Katou, an esteemed inventor from Ube, Japan, has made significant contributions to the field of materials science through his patented innovation. His work primarily focuses on the development of MgO targets for sputtering, which plays a crucial role in the formation of MgO films.

Latest Patents

Katou holds one patent titled "MgO target for sputtering." This invention discloses an MgO target that enhances the film formation rate when used in the process of sputtering MgO films. The innovation emphasizes the inclusion of magnesium oxide (MgO) alongside an electroconductive material, which not only boosts the film formation efficiency but also imparts orientation to the MgO film during the DC sputtering process.

Career Highlights

Throughout his career, Yuuzou Katou has collaborated with notable companies such as Ube Material Industries and Nippon Tungsten Co., Ltd. His work in these organizations highlights his commitment to advancing technology in material sciences. His knowledge and innovations have positioned him as a key figure in his field.

Collaborations

Katou has collaborated with fellow professionals such as Satoru Sano and Yoshihiro Nishimura. These collaborations have contributed to the refinement and successful implementation of his innovations in various industrial applications.

Conclusion

Yuuzou Katou's inventive spirit and dedication to the advancement of sputtering technology exemplify the impact of innovation in the field of materials science. His patent on the MgO target for sputtering sets a promising foundation for future research and developments, further demonstrating the importance of inventions in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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