Tokyo, Japan

Yuuta Ootsuka

USPTO Granted Patents = 3 



Average Co-Inventor Count = 5.1

ph-index = 1


Company Filing History:


Years Active: 2019-2023

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3 patents (USPTO):Explore Patents

Title: Innovations of Yuuta Ootsuka

Introduction

Yuuta Ootsuka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of composite materials and chlorosilane polymers. With a total of 3 patents to his name, Ootsuka continues to push the boundaries of innovation.

Latest Patents

One of his latest patents is a production method for composite material. This method involves creating a silicon carbide film on a porous substrate by causing a silicon source, a chlorine source, and a carbon source to react. This innovative approach enhances the properties of the composite material. Another significant patent is a method for stabilizing chlorosilane polymer. This method allows for the easy stabilization of chlorosilane polymers while preventing the generation of solid chlorosilane polymers. It includes steps to bring alcohol into contact with the chlorosilane polymer, leading to its degradation and subsequent hydrolysis.

Career Highlights

Yuuta Ootsuka is currently employed at IHI Corporation, where he applies his expertise in materials science. His work has been instrumental in advancing the company's research and development initiatives. Ootsuka's innovative methods have garnered attention in the industry, showcasing his ability to solve complex problems through inventive solutions.

Collaborations

Ootsuka collaborates with talented colleagues, including Yasutomo Tanaka and Wataru Kubota. Their combined efforts contribute to the success of various projects at IHI Corporation, fostering a collaborative environment that encourages innovation.

Conclusion

In summary, Yuuta Ootsuka is a prominent inventor whose work in composite materials and chlorosilane polymers has made a significant impact in the field. His innovative patents and collaborations highlight his dedication to advancing technology and materials science.

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