Hitachinaka, Japan

Yuujiro Kaneko

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Hitachi Automotive Systems, Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuujiro Kaneko. Retrieved from https://idiyas.com/inventor/yuujiro-kaneko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Yuujiro Kaneko: Innovator in Semiconductor Technology

Introduction

Yuujiro Kaneko is a notable inventor based in Hitachinaka, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative designs and methods.

Latest Patents

Kaneko holds a patent for a semiconductor module and a method for manufacturing this module. The semiconductor module features a case that includes a receiving space formed by a frame portion and a pair of wall portions. These wall portions are designed to face each other, with heat-dissipation portions and support walls that enhance the module's efficiency. The design allows for a plurality of semiconductor device blocks to be effectively cooled, ensuring optimal performance.

Career Highlights

Yuujiro Kaneko is currently employed at Hitachi Automotive Systems, Ltd., where he continues to develop cutting-edge technologies. His work has been instrumental in advancing semiconductor applications in automotive systems, showcasing his expertise in the field.

Collaborations

Kaneko has collaborated with esteemed colleagues such as Eiichi Ide and Takeshi Tokuyama. Their combined efforts have contributed to the success of various projects within the semiconductor industry.

Conclusion

Yuujiro Kaneko's innovative work in semiconductor technology exemplifies the impact of dedicated inventors in advancing modern technology. His contributions continue to shape the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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