Sakura, Japan

Yuuichirou Tani

This inventor holds 1 USPTO granted patent. Top assignee: Dic Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuuichirou Tani. Retrieved from https://idiyas.com/inventor/yuuichirou-tani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Yuuichirou Tani: Innovator in Liquid Crystal Technology

Introduction

Yuuichirou Tani is a notable inventor based in Sakura, Japan. He has made significant contributions to the field of liquid crystal technology, particularly through his innovative patent related to photoalignment layers.

Latest Patents

Yuuichirou Tani holds a patent for a liquid crystal alignment layer. The objective of this invention is to provide a photoalignment layer with a more reliable absorption anisotropy parameter. This advancement allows for reduced AC image-sticking. Specifically, the photoalignment layer is obtained by exposure to polarized UV radiation. It has a maximum ΔA (=A1−A2, where A1 is the absorbance in a direction parallel to the vibration direction of the polarized UV radiation, and A2 is the absorbance in a direction parallel to the vibration direction of the polarized UV radiation) of 0.35 or more per micrometer of layer thickness in a range of 230 to 380 nm.

Career Highlights

Yuuichirou Tani is associated with Dic Corporation, where he continues to work on advancements in liquid crystal technologies. His expertise and innovative approach have positioned him as a key figure in his field.

Collaborations

He has collaborated with notable colleagues such as Hiroshi Hasebe and Fumiaki Kodera. Their combined efforts contribute to the ongoing development of cutting-edge technologies in the industry.

Conclusion

Yuuichirou Tani's work in liquid crystal technology exemplifies innovation and dedication. His contributions through patents and collaborations continue to influence the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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