The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
May. 26, 2015
Dic Corporation, Tokyo, JP;
Hiroshi Hasebe, Kita-adachi-gun, JP;
Fumiaki Kodera, Kita-adachi-gun, JP;
Masanao Takashima, Kita-adachi-gun, JP;
Isa Nishiyama, Kita-adachi-gun, JP;
Hiroyuki Itou, Kita-adachi-gun, JP;
Yutaka Kadomoto, Kita-adachi-gun, JP;
Kazuki Obi, Kita-adachi-gun, JP;
Yoshitaka Saitou, Kita-adachi-gun, JP;
Yuuichirou Tani, Sakura, JP;
Keisuke Fujisawa, Sakura, JP;
DIC CORPORATION, Tokyo, JP;
Abstract
An object of the present invention is to provide a photoalignment layer with a more reliable absorption anisotropy parameter as a photoalignment layer that allows for reduced AC image-sticking. Specifically, provided is a photoalignment layer, obtained by exposure to polarized UV radiation, that has a maximum ΔA (=A1−A2, where A1 is the absorbance in a direction parallel to a vibration direction of the polarized UV radiation, and A2 is the absorbance in a direction parallel to the vibration direction of the polarized UV radiation) of 0.35 or more per micrometer of layer thickness in a range of 230 to 380 nm.