Niigata, Japan

Yuuichi Sugano


 

Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Niigata-Ken, JP (2013)
  • Niigata, JP (2008 - 2018)

Company Filing History:


Years Active: 2008-2018

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12 patents (USPTO):Explore Patents

Title: Yuuichi Sugano: Innovator in Cyanate Ester Compounds

Introduction

Yuuichi Sugano is a prominent inventor based in Niigata, Japan. He has made significant contributions to the field of materials science, particularly in the development of cyanate ester compounds. With a total of 12 patents to his name, Sugano's work has had a substantial impact on the industry.

Latest Patents

Among his latest patents are innovations related to cyanate ester compounds and curable resin compositions. One of his notable inventions involves a cyanate ester compound obtained by cyanating a modified naphthalene formaldehyde resin. This compound is designed to produce a cured product with a low dielectric constant and dielectric loss tangent, as well as excellent flame retardancy and heat resistance. Additionally, it boasts relatively low viscosity, excellent solvent solubility, and superior handling properties. Sugano's work also includes a method for producing this cyanate ester compound and a curable resin composition that utilizes it.

Career Highlights

Yuuichi Sugano is currently associated with Mitsubishi Gas Chemical Company, Inc., where he continues to innovate and develop new materials. His expertise in resin compositions has positioned him as a key figure in the advancement of high-performance materials.

Collaborations

Sugano has collaborated with notable colleagues, including Yoshikazu Shima and Masayuki Katagiri. These partnerships have fostered a collaborative environment that enhances the innovation process.

Conclusion

Yuuichi Sugano's contributions to the field of cyanate ester compounds exemplify his dedication to innovation and material science. His patents reflect a commitment to developing advanced materials that meet the demands of modern applications.

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