Sanda, Japan

Yuuichi Kohno


Average Co-Inventor Count = 5.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Hyogo, JP (2012)
  • Sanda, JP (2013)

Company Filing History:


Years Active: 2012-2013

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Yuuichi Kohno: Innovator in Semiconductor Manufacturing

Introduction

Yuuichi Kohno is a prominent inventor based in Sanda, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Kohno's latest patents include a method of manufacturing a semiconductor device that features a complex wiring layout. This method involves the deposition of a second wiring layer on multiple interlayer insulating films, ensuring precise dimensions for optimal performance. Another notable patent is a chemical mechanical polishing method that improves the flattening process of interlayer insulating films. This method utilizes a linear approximation formula to determine the polishing time required for achieving target film thicknesses.

Career Highlights

Kohno is currently employed at Ricoh Company, Ltd., where he continues to innovate in semiconductor technology. His expertise in manufacturing processes has positioned him as a valuable asset in the industry. His contributions have not only advanced the technology but also improved production efficiency.

Collaborations

Kohno has collaborated with notable colleagues, including Masanori Miyata and Taro Usami. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies in semiconductor manufacturing.

Conclusion

Yuuichi Kohno's work exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborations reflect a commitment to advancing technology and improving manufacturing processes. His contributions will undoubtedly continue to influence the field for years to come.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…