Tokyo, Japan

Yuto Kubonaka

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuto Kubonaka. Retrieved from https://idiyas.com/inventor/yuto-kubonaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yuto Kubonaka and Electronic Cleaning Technology.

Introduction

Yuto Kubonaka is an inventor based in Tokyo, Japan, associated with Hitachi High-Tech Corporation. His patent work includes an electronic cleaning device designed to reduce contamination inside a sample chamber.

Latest Patents

Kubonaka is credited with 1 patent, titled “Electronic Cleaning Device.” The invention addresses contamination caused when hydrocarbon gas is dissociated by electron irradiation, depositing carbon on chamber components and sample surfaces.

The device includes a sample chamber connected to a lens barrel containing a charged-particle source, an electron source positioned inside the chamber, and a shield plate placed in front of the electron source. Primary electrons from the source strike the shield plate, producing secondary electrons that help clean the inside of the sample chamber.

Career Highlights

Kubonaka’s listed invention focuses on managing contamination in charged-particle equipment. The patent describes a cleaning approach that uses secondary electrons generated within the chamber.

Collaborations

Kubonaka’s listed coworkers include Masaomi Ohno and Koichiro Takeuchi. His work is associated with Hitachi High-Tech Corporation.

Conclusion

Yuto Kubonaka’s patent presents an electron-based method for cleaning sample chambers and limiting contamination in charged-particle equipment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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