Osaka, Japan

Yutaka Fujiwara

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Kaneka Corporation. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yutaka Fujiwara. Retrieved from https://idiyas.com/inventor/yutaka-fujiwara-0cnc1v8a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Yutaka Fujiwara: Innovator in Film Production Technology

Introduction

Yutaka Fujiwara is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of film production technology, particularly through his innovative methods that enhance the quality of extruded films.

Latest Patents

Fujiwara holds a patent for a method of producing film, which is designed to suppress the formation of die lines in melt extrusion molding using a T die. The method involves melting and kneading a thermoplastic resin composition that has a relaxation modulus between 100 Pa and 2,000 Pa. This composition may include an acrylic resin and rubber particles, ensuring high-quality film production.

Career Highlights

Fujiwara is associated with Kaneka Corporation, where he has been instrumental in developing advanced materials and production techniques. His work has not only improved manufacturing processes but has also contributed to the overall efficiency of film production.

Collaborations

Fujiwara collaborates with Keisuke Hatano, leveraging their combined expertise to push the boundaries of innovation in their field.

Conclusion

Yutaka Fujiwara's contributions to film production technology exemplify the impact of innovative thinking in manufacturing processes. His patent and work at Kaneka Corporation highlight the importance of advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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