Tokyo, Japan

Yuta Daijima

This inventor holds 2 USPTO granted patents and 6 published patent applications. Top assignees: Hitachi Chemical Company, Ltd. (Fipas), Resonac Corporation. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuta Daijima. Retrieved from https://idiyas.com/inventor/yuta-daijima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: **Yuta Daijima: Innovator in Photosensitive Resin Technology**

Introduction

Yuta Daijima, based in Tokyo, Japan, is a notable inventor recognized for his contributions to the field of photosensitive resin technology. With a total of two patents to his name, Daijima has made significant advancements in the manufacturing methods of printed wiring boards, enhancing functionality and reliability.

Latest Patents

His latest patents revolve around a sophisticated photosensitive resin composition, which is designed to be effectively utilized in both projection exposure and direct-write exposure machines. This innovative composition facilitates the formation of resist patterns that exhibit an excellent cross-sectional shape. Notably, it minimizes issues such as undercuts—where the bottom portion of the resist is hollowed out—and the omission of the upper part of the resist pattern. Furthermore, the invention ensures that the line widths in the central and deepest sections of the resist pattern are consistently narrower than those at the surface, promoting favorable linearity in depth direction. The combination of an acid-modified vinyl group-containing epoxy resin, photopolymerization initiators, sensitizers that include benzophenone compounds, and photopolymerizable compounds contributes to remarkable insulation reliability and crack resistance.

Career Highlights

Yuta Daijima has accumulated valuable experience working with prestigious companies such as Hitachi Chemical Company, Ltd. and Resonac Corporation. His tenure at these firms has allowed him to refine his expertise in materials science and resin technology, stimulating further innovation in his patented work.

Collaborations

Throughout his career, Daijima has collaborated with distinguished professionals such as Nobuhito Komuro and Masayuki Kojima. Their collective efforts have driven advancements in technology, particularly in the realm of circuitry and materials used in electronics manufacturing.

Conclusion

Yuta Daijima's contributions to the field of photosensitive resin technology are noteworthy and reflect the importance of innovation in electronics. His patents not only showcase his inventive prowess but also address critical challenges in manufacturing processes, thus paving the way for new possibilities in the industry. As he continues to push boundaries in innovation, the impact of his work will significantly influence future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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