Yusuke Tachino

Title: Yusuke Tachino: Innovator in Metal Contamination Prevention

Introduction

Yusuke Tachino is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing and metal contamination prevention. With a total of 4 patents to his name, Tachino's work is recognized for its innovative approaches and practical applications.

Latest Patents

Tachino's latest patents include a metal contamination prevention method and apparatus, as well as a substrate processing method using the same and apparatus therefor. The metal contamination prevention method involves passing a metal chloride gas through a metal component that has a surface covered with an inactive film formed of chromium oxide. This method includes generating chromium chloride (III) hexahydrate by supplying hydrochloric acid to the inactive film and allowing it to react with the chromium oxide. The process also involves removing chromium from the inactive film by evaporating the chromium chloride (III) hexahydrate and covering the surface of the inactive film with a compound containing a metal from the metal chloride gas.

The method of controlling a gas supply apparatus includes a vaporizer, a carrier gas supply source, and a gas supply line. This method entails supplying a liquid or solid raw material to a raw material container in the vaporizer, vaporizing it to produce a raw material gas, and exhausting the interior of the raw material container. The carrier gas is supplied from the carrier gas supply source to the raw material container, allowing the raw material gas and carrier gas to flow to a processing chamber where the substrate is accommodated.

Career Highlights

Yusuke Tachino is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative methods, contributing to advancements in substrate processing technologies.

Collaborations

Tachino has collaborated with notable coworkers, including Hiromi Shima and Shigeru Nakajima. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Yusuke Tachino's contributions to the field of metal contamination prevention and substrate processing are noteworthy. His innovative patents and collaborative efforts at Tokyo Electron Limited highlight his commitment to advancing technology in this critical area.