Yokkaichi, Japan

Yusuke Miki

This inventor holds 1 USPTO granted patent and 8 published patent applications. Top assignee: Kioxia Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yusuke Miki. Retrieved from https://idiyas.com/inventor/yusuke-miki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yusuke Miki: Innovator in Semiconductor Technology

Introduction

Yusuke Miki is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to film forming apparatuses.

Latest Patents

Yusuke Miki holds a patent for a film forming apparatus and method of manufacturing semiconductor devices. This invention includes a chamber designed to load a substrate, a stage to support the substrate, and a gas supplier that introduces gas into the chamber to form a film on the substrate. Additionally, the apparatus features a first detector that measures a value influenced by the pressure in a specific area above the stage, and a controller that regulates the film formation process based on this detected value. He has 1 patent to his name.

Career Highlights

Miki is currently employed at Kioxia Corporation, where he continues to advance semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Yusuke Miki collaborates with notable colleagues, including Kenichiro Toratani and Kazuhiro Katono, who contribute to the innovative environment at Kioxia Corporation.

Conclusion

Yusuke Miki's contributions to semiconductor technology through his patent demonstrate his commitment to innovation in the field. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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