Yusuke Horie

Title: Yusuke Horie: Innovator in Compound Semiconductor Technology

Introduction

Yusuke Horie is a prominent inventor based in Itami, Japan. He has made significant contributions to the field of compound semiconductors, holding a total of 2 patents. His work focuses on improving the quality and production methods of semiconductor substrates, which are essential for various electronic applications.

Latest Patents

Horie's latest patents include an inspection method of compound semiconductor substrates, a compound semiconductor substrate, a surface treatment method of compound semiconductor substrates, and a method of producing compound semiconductor crystals. The inspection method allows for the reduction of impurities on the surface of the compound semiconductor substrate. It utilizes an atomic force microscope to measure surface roughness at a precision of not more than 0.4 nm over a 0.2 µm square area. The resulting surface roughness Rms is not more than 0.2 nm, ensuring high-quality substrates. Additionally, his GaAs semiconductor substrate patent outlines a method for achieving a specific atomic ratio of Ga to As at the surface layer, which is crucial for enhancing the substrate's performance.

Career Highlights

Yusuke Horie is currently employed at Sumitomo Electric Industries, Limited, where he continues to advance semiconductor technology. His innovative approaches have positioned him as a key figure in the industry, contributing to the development of high-performance semiconductor materials.

Collaborations

Horie has collaborated with notable colleagues, including Takayuki Nishiura and So Tanaka. Their combined expertise has furthered the research and development of advanced semiconductor technologies.

Conclusion

Yusuke Horie's contributions to the field of compound semiconductors demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of semiconductor materials and their applications, making him a valuable asset to the industry.