Tokyo, Japan

Yusuke Ariake

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.9

ph-index = 1


Company Filing History:


Years Active: 2022-2023

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4 patents (USPTO):Explore Patents

Title: Yusuke Ariake: Innovator in Magnetic Materials

Introduction

Yusuke Ariake is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of magnetic materials, holding a total of 4 patents. His work focuses on developing advanced materials with unique magnetic properties, which have applications in various technological fields.

Latest Patents

Ariake's latest patents include the development of an Fe–Co–Al alloy magnetic thin film. This innovative thin film contains, in terms of atomic ratio, 20% to 30% Co and 1.5% to 2.5% Al. The film exhibits a crystallographic orientation where the (100) plane is parallel to a substrate surface, and the <100> direction is perpendicular to the substrate surface. It boasts excellent magnetic properties, including a magnetization of 1440 emu/cc or more, a coercive force of less than 100 Oe, a damping factor of less than 0.01, and an FMR linewidth ΔH at 30 GHz of less than 70 Oe. Another notable patent is for an LC composite component, which includes a magnetic substrate, a magnetic layer, inductors, capacitors, and core parts. This design enhances the performance of electronic devices by integrating magnetic properties into the component structure.

Career Highlights

Throughout his career, Yusuke Ariake has worked with notable organizations, including TDK Corporation and the University of Alabama. His experience in these institutions has allowed him to refine his expertise in magnetic materials and contribute to cutting-edge research.

Collaborations

Ariake has collaborated with esteemed colleagues such as Isao Kanada and Yoshihiro Shinkai. These partnerships have fostered innovation and have been instrumental in advancing the field of magnetic materials.

Conclusion

Yusuke Ariake is a distinguished inventor whose work in magnetic materials has led to significant advancements in technology. His patents reflect a commitment to innovation and excellence in the field.

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