Shizuoka-ken, Japan

Yusuke Abe


Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: Yusuke Abe: Innovator in Wafer Cleaning Technology

Introduction

Yusuke Abe is a notable inventor based in Shizuoka-ken, Japan. He has made significant contributions to the field of wafer cleaning technology, holding a total of 2 patents. His innovative designs focus on improving the efficiency and effectiveness of cleaning processes for semiconductor wafers.

Latest Patents

Yusuke Abe's latest patents include a "Wafer cleaning device and tray for use in wafer cleaning device." This invention features a band-shaped tray with grasping grooves for handling wafers and a cleaning tank that utilizes a conveyor robot for wafer cleaning. The cleaning tank is designed with guides for tray mounting, a V-shaped bottom to conform to the wafer's shape, and flow ports for cleaning fluid supply. Additionally, an overflow tank is integrated to manage excess cleaning fluid, complete with a circulation line for reuse.

Another significant patent is the "Multi-step flow cleaning method and multi-step flow cleaning apparatus." This invention provides a method and apparatus that effectively cleans workpieces using a stream of cleaning solution while minimizing foreign matter accumulation on surfaces. The design includes a cleaning tank, a supply line for cleaning solutions, and a valve for flow adjustment, ensuring optimal cleaning performance.

Career Highlights

Yusuke Abe is currently employed at Spc Electronics Corporation, where he continues to develop innovative solutions in the electronics sector. His work has been instrumental in advancing wafer cleaning technologies, which are crucial for semiconductor manufacturing.

Collaborations

Yusuke collaborates with talented coworkers, including Haruki Sonoda and Tetsuji Oishi. Their combined expertise contributes to the innovative environment at Spc Electronics Corporation.

Conclusion

Yusuke Abe's contributions to wafer cleaning technology demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the challenges in semiconductor manufacturing and provide effective solutions to enhance cleaning processes.

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