Beijing, China

Yushu Shi

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: National Institute of Metrology, China. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yushu Shi. Retrieved from https://idiyas.com/inventor/yushu-shi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: Yushu Shi: Innovator in Measurement Technology

Introduction

Yushu Shi is a prominent inventor based in Beijing, China. He has made significant contributions to the field of measurement technology, holding a total of 2 patents. His work focuses on innovative systems that enhance precision in measurement applications.

Latest Patents

Yushu Shi's latest patents include a composite measurement system for measuring nanometer displacement. This system comprises a light source, a polarization beam splitting prism, and various modules designed to calculate displacement based on light intensity changes. Another notable patent is a surface texture probe and measurement apparatus featuring a vibrational membrane. This apparatus includes a housing, a stylus holder, and a vertical guide assembly, allowing for precise surface texture measurements.

Career Highlights

Yushu Shi is affiliated with the National Institute of Metrology, China, where he applies his expertise in developing advanced measurement technologies. His innovative approaches have positioned him as a key figure in the field.

Collaborations

Some of Yushu Shi's coworkers include Shu Zhang and Fang Wang, who contribute to the collaborative efforts in research and development at the National Institute of Metrology.

Conclusion

Yushu Shi's contributions to measurement technology through his patents and work at the National Institute of Metrology highlight his role as an influential inventor. His innovative systems continue to advance the precision of measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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