Yuru Chu

Title: Yuru Chu - Innovator in Semiconductor Technology

Yuru Chu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Yuru Chu holds a patent for a "Device with differential field isolation thicknesses and related methods." This patent describes a semiconductor device structure that utilizes differential field oxide thicknesses. The invention allows for a single field oxidation step to produce a nitrided field oxide region that is thinner than a non-nitrided field oxide region. The design ensures that the bird's beak of the nitrided field oxide encroaches less into the active cell region compared to the thicker non-nitrided field oxide. This differential field oxide thickness enables the isolation of multi-voltage integrated circuit devices, such as flash memory devices, while increasing the available active cell area for a given design rule. Yuru Chu has 1 patent to his name.

Career Highlights

Throughout his career, Yuru Chu has focused on advancing semiconductor technologies. His work has contributed to the development of more efficient and effective integrated circuit devices. His innovative approaches have garnered attention in the industry, showcasing his expertise and commitment to technological advancement.

Collaborations

Yuru Chu has collaborated with Kuo-Tung Sung, further enhancing his work in the semiconductor field. Their partnership has likely led to the exchange of ideas and innovations that benefit their projects.

Conclusion

Yuru Chu is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His patent on differential field isolation thicknesses exemplifies his innovative spirit and dedication to improving integrated circuit devices. His contributions continue to influence the field and inspire future advancements.