Company Filing History:
7 out of 7 
4 out of 832,880 Years Active: 1999-2001
Title: The Innovative Mind of Yuri Maishev: A Pioneer in Plasma Technology
Introduction: Yuri Maishev, an accomplished inventor based in Moscow, Russia, holds an impressive portfolio of 11 patents. His work in plasma technology and ion-beam sources has opened new avenues in the fields of science and engineering. This article explores his latest patents, career highlights, and collaborations that showcase his contributions to innovation.
Latest Patents: Among his recent innovations, Yuri Maishev has developed two notable patents. The first is a **multiple-cell source of uniform plasma**, which comprises a pair of perforated plate-like cathodes and a perforated plate-like anode situated between them. This configuration creates numerous cells where Penning discharge plasma is generated. The unique design allows for an increased surface area of the upper cathode plate, facilitating treatment of larger objects without limitations. Moreover, the plasma source incorporates various mechanisms for controlling and adjusting plasma patterns, parameters, and shapes.
The second patent, an **ion-beam source with a virtual anode**, features a cold-cathode type ion-emitting slit. Instead of a traditional metal anode, it utilizes a pair of positively charged conductive rings within the ion source’s hollow housing. This innovation minimizes contamination of the ion beam by metallic erosion products and enhances ion beam current, leading to more effective ionization of the working gas. These advancements represent significant progress in ion-beam technologies.
Career Highlights: Yuri Maishev has built a strong career in research and development, contributing significantly to plasma technology. His tenure at Advanced Ion Technology, Inc. allowed him to hone his expertise and drive forward various projects aimed at improving ion-beam and plasma applications. Through these roles, he has demonstrated exceptional ingenuity and technical prowess.
Collaborations: Throughout his career, Yuri has collaborated with esteemed colleagues, including James A. Ritter and Leonid Velikov. Their collective insights and expertise have undoubtedly enriched the scope of their projects and the resulting innovations in plasma technology.
Conclusion: Yuri Maishev stands out as a remarkable inventor whose contributions to plasma technology are significant. With his advanced patents and continued work in the field, he inspires future innovations that could revolutionize various technological applications. His dedication to advancing our understanding and capabilities in plasma and ion-beam sources ensures that his work will have a lasting impact for years to come.