Osaka, Japan

Yuri Goto

This inventor holds 1 USPTO granted patent. Top assignee: Nihon Nohyaku Co., Ltd.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuri Goto. Retrieved from https://idiyas.com/inventor/yuri-goto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Yuri Goto

Introduction

Yuri Goto is a notable inventor based in Osaka, Japan. She has made significant contributions to the field of chemistry, particularly in the development of optically active compounds. Her work has led to advancements in antifungal compositions, showcasing her innovative spirit and dedication to research.

Latest Patents

Yuri Goto holds a patent for an optically active compound, specifically an (R)-(E)-(4-substituted-phenyl-1,3-dithiolan-2-ylidene)-1-imidazolylacetoni trile derivative. This compound is represented by a specific formula and includes various substituents, such as halogen atoms and alkyl groups. The patent also covers an antifungal composition that utilizes this compound, along with a process for its production. She has 1 patent to her name.

Career Highlights

Yuri Goto is currently associated with Nihon Nohyaku Co., Ltd., where she continues to engage in innovative research and development. Her work at the company has been instrumental in advancing the field of agricultural chemistry, particularly in the creation of effective antifungal agents.

Collaborations

Yuri has collaborated with notable colleagues, including Koichiro Harada and Takashi Kagawa. These partnerships have fostered a collaborative environment that enhances the research and development process.

Conclusion

Yuri Goto's contributions to the field of chemistry and her innovative patents highlight her role as a leading inventor in Japan. Her work continues to impact the industry positively, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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