This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2008.
Company Filing History:
Years Active: 2008
Title: Innovations of Yuri D Bogunenko
Introduction
Yuri D Bogunenko is a notable inventor based in Sarov, Russia. He has made significant contributions to the field of photolithography, particularly in the synthesis of photolithography masks. His work is recognized for its potential to enhance the efficiency of photolithography processes.
Latest Patents
Yuri D Bogunenko holds a patent for the "Modification of pixelated photolithography masks based on electric fields." This invention describes a faster synthesis method for photolithography mask modifications. In one embodiment, the invention includes synthesizing a first binary photolithography mask, developing perturbations to an estimated electric field generated by the first mask in use, and synthesizing a second binary photolithography mask by applying the perturbations to the first mask. He has 1 patent to his name.
Career Highlights
Yuri D Bogunenko is currently employed at Intel Corporation, where he continues to innovate in the field of photolithography. His work at Intel has positioned him as a key player in advancing technologies related to semiconductor manufacturing.
Collaborations
Yuri has collaborated with notable colleagues such as Vivek K Singh and Victor P Bashurin. Their combined expertise contributes to the innovative environment at Intel Corporation.
Conclusion
Yuri D Bogunenko's contributions to photolithography and his innovative patent demonstrate his significant role in advancing technology in the semiconductor industry. His work continues to influence the field and showcases the importance of innovation in engineering.