This inventor holds 1 USPTO granted patent. Top assignee: Shanghai Huali Microelectronics Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Yunong Sun and Nanoscale Failure Analysis
Introduction
Yunong Sun is an inventor based in Shanghai, China. His patent work includes a method for nanoscale failure analysis, and he is associated with Shanghai Huali Microelectronics Corporation.
Latest Patents
Sun is named on one patent application, titled “Nanoscale Failure Analysis Method.” The disclosed method uses a focused ion beam (FIB) machine to cut a selected area of a sample and expose a metal pattern. An electron-beam-deposited protective layer helps protect the pattern and prevent metal diffusion while the sample is transferred to a nano prober. The protective layer is then removed through ion-source surface treatment, after which the metal pattern is probed and electrically tested. Sun’s reported patent count is 1 patent.
Career Highlights
Sun’s listed affiliation is Shanghai Huali Microelectronics Corporation. The described invention addresses sample preparation and electrical testing in nanoscale failure analysis.
Collaborations
Cheng Wu and Shuqing Duan are identified as Sun’s coworkers. The available information does not specify their roles in the patent or the invention.
Conclusion
Yunong Sun’s patent work focuses on a nanoscale failure analysis method designed to protect metal patterns during sample transfer and enable subsequent electrical testing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile