This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Yungsang Kim - Innovator in Plasma Etching Technology
Introduction
Yungsang Kim is a notable inventor based in San Jose, California. He has made significant contributions to the field of plasma etching technology, particularly in processes that enhance selectivity in semiconductor manufacturing. His innovative approach has led to advancements that are crucial for the electronics industry.
Latest Patents
Yungsang Kim holds a patent for an invention titled "Oxide/nitride etching having high selectivity to photoresist." This patent describes a single-step plasma etch process that allows for the selective etching of both oxide and nitride materials relative to photoresist and silicon. The etching gas utilized in this process includes a combination of fluorocarbon, difluoromethane, oxygen, and carbon monoxide. Notably, the fluorocarbon used is preferably hydrogen-free, with preferred options including hexafluorobutadiene, octafluorocyclobutane, and carbon tetrafluoride, with carbon tetrafluoride being the most favored. The process involves supplying approximately equal amounts of fluorocarbon, difluoromethane, and oxygen, along with a significantly larger quantity of carbon monoxide. This innovative chemistry is also applicable to etching organo silicate glass selectively to photoresist.
Career Highlights
Yungsang Kim is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in the development of advanced manufacturing technologies. His patent reflects his expertise and commitment to improving processes that are vital for the production of electronic components.
Collaborations
Yungsang has collaborated with esteemed colleagues such as Claes H Bjorkman and Takehiko Komatsu. These collaborations have further enriched his work and contributed to the advancements in the field of plasma etching.
Conclusion
Yungsang Kim's contributions to plasma etching technology exemplify the innovative spirit that drives progress in the semiconductor industry. His patent and work at Applied Materials, Inc. highlight his role as a significant inventor in this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
