Taoyuan, Taiwan

Yung-Yu Lin


Average Co-Inventor Count = 2.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Taoyuan County, TW (2013)
  • Taoyuan, TW (2021)

Company Filing History:


Years Active: 2013-2025

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Yung-Yu Lin in the Field of Photoresist Technology

Introduction

Yung-Yu Lin is a prominent inventor based in Taoyuan, Taiwan, with a notable portfolio consisting of four patents. His innovative work primarily revolves around advancements in photoresist technology, which is crucial in semiconductor manufacturing and electronic component production.

Latest Patents

Among his latest patents, Yung-Yu Lin has developed methods that significantly enhance the processing of photoresist layers. One of his innovations details a method of removing photoresist. This method consists of forming a release layer on a substrate, with the release layer having a first and second surface. The process includes applying a photoresist layer to the second surface and subsequently removing both layers. The release layer is crafted from a polyimide resin, synthesized through the polymerization of tetracarboxylic dianhydrides, diamines, and phenolamines.

Additionally, he has patented a polyimide resin composition that integrates a polyimide resin adhesive layer and involves a manufacturing method for electronic components. This innovative material is generated through the polymerization reaction of a specific diamine and tetracarboxylic dianhydride, aiming to enhance the performance and reliability of electronic products.

Career Highlights

Yung-Yu Lin has been associated with significant companies in the technology sector, including Lidashi Industry Co., Ltd. and Echem Solutions Corporation. His experience in these organizations has provided him with a valuable foundation for his inventive pursuits in the field of polymers and materials science.

Collaborations

Throughout his career, Lin has collaborated with esteemed colleagues, such as Chi-Yu Lai and Che-Wei Chang. These partnerships have fostered a collaborative spirit and contributed to the creation of cutting-edge technologies in the industry.

Conclusion

Yung-Yu Lin's inventive endeavors have left a noteworthy impact on the field of photoresist technology and electronic components. With a solid foundation of patents and collaborations, his work continues to propel advancements in the industry, demonstrating the importance of innovation in contemporary technology.

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